05 Oct 09 D2S, Advantest speed up e-beam lithography

The eBeam Initiative, a forum for the promotion of chip manufacturing using e-beam lithography, has said that two of its leading members Direct2Silicon Inc. (San Jose, Calif.) and Advantest Corp. (Tokyo, Japan), have collaborated to enhance throughput.



Sponsored Topics: San Jose California - Tokyo - Advantest - San Jose - Japan
Tagi: advantest corp, e beam, san jose california, tokyo japan, lithography, throughput, initiative

24 Feb 10 Berkeley puts flying litho on the runway

At the SPIE Advanced Lithography event here, the University of California at Berkeley provided an update on a technology called plasmonic nano-lithography--based on a flying lens.



University of California - Berkeley - United States - California - Education
Tagi: university of california berkeley, california at berkeley, university of california at berkeley, educati, lithography, university of california, united states

25 Feb 10 EUV metrology R&D doesn't add up

The numbers for the development of future EUV mask and metrology tools do not add up, according to experts at the SPIE Advanced Lithography event here.



Technology - SPIE - Metrology - Business - Industrial Goods and Services
Tagi: metrology tools, lithography, mask

18 Jul 10 Lithography roadmap offers questions and openings

An undercurrent of disquiet at Semicon West this week sprang from deep uncertainty in the roadmap for advanced lithography.
Tagi: lithography, undercurrent, roadmap, uncertainty

04 Sep 10 Cambridge scientists develop lower-than-low power WORM memory

Researchers at Cambridge University have recently published a paper on their new type of WORM (write once read many) memory which is even more low powered than the ones that came before it. The new electron-only design of the memory is solution processed, making it low cost as well as it requires no lithography. The device, using ZnO semiconductor nanoparticles to inject electrons into a polymer which is capable of conducting. The electrons are then used to program the memory by permanently lowering the conductivity of the polymer, producing insulation. This result is far lower power densities than previously recorded, by orders of magnitude. The research team believes that it can make further improvements to the device as they continue to work.

Cambridge scientists develop lower-than-low power WORM memory originally appeared on Engadget on Fri, 03 Sep 2010 18:01:00 EDT. Please see our terms for use of feeds.

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Tagi: cambridge scientists, power worm, power densities, engadget, orders of magnitude, fri, cambridge university, nanoparticles, lithography, polymer, nbsp, improvements, memory